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Observations of Liquid Lithium Uptake in a Porous Molybdenum Foam

Authors: Jawarski, M. A., Laua, C. Y., Urbansky, D. L., Malfa, M. B., Gray, T. K., Neumann, M. J., Ruzic, D. N.

J. of Nuclear Materials, 378, 105-109 (2008).
Jawarski, M. A., Laua, C. Y., Urbansky, D. L., Malfa, M. B., Gray, T. K., Neumann, M. J., Ruzic, D. N.
Recent experiments with liquid lithium in magnetically confined plasmas have demonstrated improved plasma performance. These results have led researchers working on the National Spherical Torus Experiment to consider using [...]

Time Exposure Performance of Mo-Au Gibbsian Segregating Alloys for Extreme Ultraviolet Collector Optics

Authors: Qiu, H., Srivastava, S. N., Thompson, K. C., Neumann, M. J., Ruzic, D. N.

Appl. Opt. 47, 2443-2451 (2008).
Qiu, H., Srivastava, S. N., Thompson, K. C., Neumann, M. J., Ruzic, D. N.
Successful implementation of extreme ultraviolet (EUV) lithography depends on research and progress toward minimizing collector optics degradation from intense plasma erosion and debris deposition. Thus studying the surface degradation process and implementing innovative methods, which could enhance the [...]

Tin Removal From Extreme Ultraviolet Collector Optics by Inductively Coupled Plasma Reactive Ion Etching

Authors: Shin, H., Srivastava, S. N., Ruzic, D. N.

J. Vac. Sci. Technol., 26(3), 389-398 (2008).
Shin, H., Srivastava, S. N., Ruzic, D. N.
Tin (Sn) has the advantage of delivering higher conversion efficiency compared to other fuel materials (e.g., Xe or Li) in an extreme ultraviolet (EUV) source, a necessary component for the leading next generation lithography. However, the use of a condensable fuel in [...]

Preliminary Evidence of Field Induced Rhenium Etching by XeF2 at High Vacuum

Authors: Castano, D., Aghazarian, M., Ruzic, D. N.

J. Applied Physics, 103, 044901-4 (2008).
Castano, D., Aghazarian, M., Ruzic, D. N.
Preliminary evidence of enhanced etching of rhenium by XeF2 under the influence of an electric field (3.36  GV/m) is presented. Scanning electron microscope photographs of sharp rhenium tips show etching of at least 0.40  µm ±0.07 in 32  min at the point of maximum electric field, indicating [...]