• CCPs are simple, low impurity plasmas commonly used for processing. EEDF influences the rate of reactions and collisions, impacting species generation and processing parameters
• EEDF varies over the course of one RF cycle (74 ns period in 13.56 MHz supply)
• ns resolution time resolved Langmuir probe used to measure electron density and EEDF throughout the RF cycle.
This work uses a time-resolved Langmuir probe to measure the electron energy distribution function (EEDF) in a capacitively-coupled parallel-plate (CCP) plasma reactor. The EEDF completely determines the plasma chemistry in a low-temperature plasma, and that is why it is so important to obtain. By seeing how the EEDF changes throughout an RF cycle, both as a function of time and position, one then knows the extent by which altering the RF waveform can affect the energy of the electrons. Often industry mixes RF frequencies to alter the plasma — particularly the ion energy distribution at the substrate. Here we add a second frequency in a systematic manner and examine the changes in the instantaneous EEDF. We also examine the turn on and turn off times of the RF generator itself. Specialized circuits were designed for this work to ensure high frequency fidelity so digitization at 1.5 GHz is possible and accurate. A set of experiments were conducted to show how only altering circuit parameters affect the results, and steps were taken to eliminate those effects. Spatial variations of the resulting EEDFs were investigated, especially near the edge of the CCP reactor, to see which aspects change the most with radius.



SHADE has two 4-inch PVD sputtering guns, a load-lock and a rotating sample stage. It is also outfitted with detailed diagnostics to enable time-resolved measurements of HIPIMS discharges. It is powered by a Starfire Industries IMPULSE that is capable of cathode-voltage reversal. It has been used to make multi-layer mirrors, and do reactive sputtering experiments.
This is a PVD sputtering tool manufactured by the Material Research Corporation (MRC). It uses a 14 inch diameter target and a rotating magnet pack. We have outfitted it with a variety of HIPIMS power supplies, used a variety of magnet packs, diagnostics and internal ionization coils.
ECAP is a microwave-powered atmospheric-pressure plasma torch. It has three zones where reactants can be introduced to the plasma. In this way it can make a variety of coatings, which would normally require a vacuum system to produce.
When a femtosecond laser pulse hits a surface, the power is incredible. It is so intense that it instantly turns the surface into a plasma even before the laser pulse ends. This means there is a chance that the laser light is converted to surface plasmons, and they will deposit their energy as a constructively interfered wave. This leads to ripples on the surface with dimensions near the wavelength of the initial laser. This texturing can be used for photonic properties, or to alter the wetting of the surface. We learned that such ripples can prevent wetting of metal surfaces by lithium.
XCEED is an XTS-13-35 EUV source made by Xtreme Technologies. The same model source was used to make the very first chips that used EUV lithography in INTEL’s MET tool. It uses a discharge-produced plasma from a Z-pinch and puts 5 J of energy into the plasma in 5ns. This device will be re-purposed to study warm-dense matter in a project funded by Los Alamos National Laboratory.