Extreme ultraviolet lithography (EUVL) is one of the cutting-edge leading technologies in a semiconductor industries. For tin Cross Section Measurements, the mean free path of an ion as it travels through the EUV source is dependent on the cross section. For tin Diffusion Coefficient Measurements, tin vapor, generated as ions neutralize, diffuses throughout the system. […]
Category: Experiments
CO2 Laser Enhancement for EUV lithography
CO2 drive lasers are a vital component of current EUV lithography tools. Up to 60-80% of the CO2 dissociates into CO and O during operation of ICP. Oxygen creates parasitic species (Ox, NOX) which lower laser efficiency. Auxiliary plasmas are being studied to dissociate parasitic species and preferentially recombine CO and O into CO2. We […]
Liquid Metal Work
CPMI is a big proponent of lithium as the most promising fusion PFC with both Dr. Ruzic and Dr. Andruczyk having extensive experience and current projects working with lithium or its alloys.
Lithium Corrosion
•Material Attacked by Lithium Corrosion Experiment (MALiCE). •Extended static molten lithium exposure. •6 individual canisters. •Canisters held at 1 to 5 PSI of Ar during exposure. •Spinning Lithium Attacked Potential Substrates (SLAPS). •Extended dynamic molten lithium exposure. •8 samples in 1 experimental session. •Corrosion tests conducted under high vacuum.
Liquid Metal Infused Trenches (LiMIT) in a SLiDE Lithium Loop
The Solid/Liquid Divertor Experiment (SLiDE) chamber is used to expose divertor concepts to fusion relevant heat fluxes to test their viability. •Solid/Liquid Divertor Experiment (SLiDE) chamber to test divertor concepts under representative heat fluxes. •SLiDE generates a E-beam or a ECR plasma. •Focuses on liquid metal divertor concepts. •Loop allows liquid metal flow for extended […]
Extreme Ultraviolet Light
Extreme ultraviolet (EUV) light at the desired wavelength, 13.5 nm, is created through very high energy releases of photons due to the de-excitation of heavily ionized tin, Sn14+. This degree of ionization is only possible in a strong plasma, which in industry is created by irradiating tin droplets with a high-power laser. A large problem […]
Pellet Radical Probes
Radicals are very important for many of the processes that occur during the production of computer chips and other processes involving plasmas. However, the direct measurement of radical density is difficult due to their reactivity and tendency to recombine with themselves. Instead, by catalyzing the recombination process and measuring the heat released, one can infer […]
Etching Degradation of Elastomer O-rings
• Elastomer O-rings are commonly used as vacuum seals, O-ring degradation and particulate generation has been observed in some plasmas systems• Mechanistic understanding of O-ring degradation from plasma exposure could enable new, resilient elastomer development• Degradation tests conducted in semiconductor industry relevant gases and chamber layout• Etching species diagnostic experiments• Prototype radical probes designed and […]
Time, Mass, and Energy Resolved Diagnostics
•Time and Energy resolved Mass Spectroscopy, allows for differentiation between metal and gas ions• Ion Energy Distribution Functions (IEDF)• Time resolved measurement of ion energy during a HiPIMS pulse showing energy increase during the kick• Electron Energy Distribution Functions (EEDF)• Shows the evolution of the electron energy as well as plasma density during the discharge
High Power Impulse Magnetron Sputtering (HiPIMS)
Pulsed deposition technique• Up to 100’s of kW peak power for the same average power as direct current magnetron sputtering (DCMS)• High peak power means electron density can be 2 orders of magnitude higher for HiPIMS than DCMS• Higher electron density leads to higher ionization fraction which improves film density, hardness, and conformality• Positive voltage […]