News

CPMI graciously welcomes the Vice President and Chief Technical Officer from Novellus who will be visiting our laboratory this week. Welcome to the University of Illinois!

CPMI will be presenting at the 52nd Annual Meeting of the APS Division of Plasma Physics in Chicago, Illinois, Nov. 8-12.

(Click to view abstracts)

Monday, November 8, 2010

9:30 AM (Poster)
BP9.00046 : Triple Langmuir Probe Circuit Response to Dynamic Loading.  Vijay Surla,  Michael Jaworski,  Joshua Kallman, Robert Kaita, Henry Kugel, David Ruzic

2:00 PM (Poster)

CP9.00115 : Upgrade of a Theta Pinch Plasma Source for Energetic Plasma Flow Generation and Fusion-Related Material Interaction Study.  Soonwook Jung,  Vijay Surla,  David Ruzic

4:12 PM – 4:24 PM   

JO7.00012 : Application of the Thermoelectric Effect on the Liquid Lithium Heat Transfer. Wenyu X,  Vijay Surla,  David Ruzic

 Thursday, November 11, 2010

2:00 PM (Posters)

UP9.00020 : Apparatus for Seebeck Coefficient Measurements of Lithium-7 and Lithium-6.   Maryann Tung, Vijay Surla,  Wenyu Xu, David Ruzic, Dennis Mansfield

UP9.00021 : Chemical Erosion Studies of Lithiated Graphite.  Priya Raman, Vijay Surla,  David Burns, David Ruzic

The 57th International AVS Symposium and Exhibition is being held on October 17-22, 2010 in Albuquerque, New Mexico.

CPMI is giving the following presentations (Click title to view abstracts):

 Characterization and Applications of Three Different Configured Atmospheric Pressure Plasma Sources   Z. Ouyang, V. Surla, S. Jung, M.J. Neumann, D.N. Ruzic

  Low-Temperature Deposition of Transparent Conducting Oxides on Plastic Substrates  E. Ritz, M. Neumann, D.N. Ruzic, L. Meng (University of Illinois), T. Dockstader (Kurt J. Lesker Company)

 Improving the Quality of PVD Cu Seed Layer for Interconnect Metallization A. Dulkin, E. Ko, L. Wu, I. Karim, K. Lesser, K.J. Park (Novellus Systems, Inc.) L. Meng, D.N. Ruzic (University of Illinois) 

Plasma Study in Modulated Pulse Power (MPP) Magnetron Sputtering with Different Magnetron Configuration  D.N. Ruzic, L. Meng, S. Jung, M.J. Neumann

CPMI graduate students Wenyu Xu and Soonwook Jung both passed the PhD qualifiying examination held in August. CONGRATULATIONS on your performance!

CPMI will be welcoming two new postdoctoral researchers on September 16th.  Both are experienced researchers and will be an asset to the CPMI team.

Tae Cho comes to us from Korea. He received his PhD in 2002 and has had 8 years of valued experience post PhD. He  has been a postdoctoral researcher in the past, a Chief Engineer, and spent 5 years working in industry.

Daniel Andruczyk comes to us from Austrailia. He  received his PhD in 2006 and has had 4 years of valued experience post PhD.  He has previously been a postdoctoral researcher in two institutions. 

WELCOME!

CPMI is pleased to welcome aboard our newest graduate student Jungmi Hong.

CPMI is pleased to welcome visiting graduate researcher, Heriberto Ortiz. Heriberto comes to us from Queretaro, Mexico and will be working throughout the Fall 2010 semester.

Members of the CPMI gathered to wish departing post-doc Vijay Surla well as he leaves the Urbana campus. Vijay has spent the past two years working with the atmospheric plasma and fusion plasma research at CPMI. He will continue his post-doc research of fusion plasmas at the Princeton Plasma Physics Laboratory along with other alums of the CPMI Michael Jaworski and Travis Gray.
Thank you for your work and good luck, Vijay!

SPIE Awards $4500 BACUS Scholarship to Wayne Lytle

BELLINGHAM, Washington, USA – May 21, 2010 – SPIE has awarded a $4500 BACUS Scholarship to Wayne Lytle, Univ. of Illinois Urbana-Champaign (Urbana IL USA).

Lytle is pursuing his PhD in the Department of Nuclear, Plasma and Radiological Engineering. His thesis topic is related to the development of a contact-less cleaning technology that is plasma based, dry and in situ for the cleaning of lithographic masks or other surfaces used for integrated circuit manufacturing. He invented two new techniques called PACE, for Plasma-Assisted Cleaning by Electrostatics and PACMAN, Plasma-Assisted Cleaning by Metastable Atom Neutralization and showed how they can clean EUV masks without damaging the pattern.

In 2010 SPIE will be awarding $323,000 in scholarships to 137 outstanding students based on their potential for long-range contribution to optics and photonics, or a related discipline.

Award-winning applicants were evaluated and approved by the SPIE Scholarship Committee. For more information on SPIE’s scholarship program, visit spie.org/scholarships.

SPIE is the international optics and photonics society, founded in 1955 to advance light- based technologies. Serving more than 188,000 constituents from 138 countries, the Society advances emerging technologies through interdisciplinary information exchange, continuing education, publications, patent precedent, and career and professional growth. SPIE annually organizes and sponsors approximately 25 major technical forums, exhibitions, and education programs in North America, Europe, Asia, and the South Pacific.