XCEED is an XTS-13-35 EUV source made by Xtreme Technologies. The same model source was used to make the very first chips that used EUV lithography in INTEL’s MET tool. It uses a discharge-produced plasma from a Z-pinch and puts 5 J of energy into the plasma in 5ns. This device will be re-purposed to study warm-dense matter in a project funded by Los Alamos National Laboratory.