Jan Uhlig

Biography

Laser bombardment induced plasma on glass-phase tin containing ceramic

Seen here is an example of a high powered Nd:YAG laser hitting a 5a% Tin glass-phase ceramic and the subsequent illumination. The purpose of this project is to build a small scale Extreme Ultraviolet Lithography setup useable for research purposes. EUV is produced from +8 through +12 ionized states of Tin, which are achieved in the laser produced plasma. EUV Lithography has been a topic of research for industrial applications since the mid-to-late 1990s, being introduced in commercial production environments starting in 2019. Our effort to build a small scale EUVL system for research applications is focused upon permitting the characterization, use, and eventual improvement of EUV photoresist.

Email juhlig2@nospam6289854ed3704.illinois.edu