L. Ning, “Chemically Enhanced Physical Vapor Deposition (CEPVD) of Tantalum Nitride-Based Films for Diffusion Barrier Layers Used in ULSI Devices,” Ph.D. Thesis, NPRE, University of Illinois, Champaign-Urbana, 2004.
L. Ning, “Ionized Physical Vapor Deposition of Aluminum Oxide,” M.S. Thesis, NPRE, University of Illinois, Champaign-Urbana, 2002.