News

Alumnus Stops By.

February 4, 2013

CPMI was visisted by one our alumni this week, as Shailendra Srivastava now employed at Cymer/ASML stopped by our laboratory.

CPMI Family Grows Larger

November 12, 2012

The CPMI family would like to extend their congratulations to Liang Meng who became a proud father on Tuesday, November 6th with the birth of his daughter, Evie Lu Meng.

David Ruzic awarded “The Plasma Prize” at AVS Conference

November 6, 2012

Last week the CPMI Director, David Ruzic, was awarded the prestigious “Plasma Prize” from the Plasma Science and Technology Division of the American Vacuum Society.  It is awarded once per year to a recognized leader in the field. The citation reads, “For his pioneering contributions to the science of processing plasmas and the societal benefits of plasma technology.”  Congratulations to Professor Ruzic for garnering such an honor.

David Ruzic and CPMI win DOE Materials Grant

June 26, 2012

Today it was announced that CPMI’s David Ruzic and hie liquid lithium group has been awarded a grant under the Department of Energies Materials solicitation. The grant is to study Thermoelectric-Driven Liquid-Lithium Plasma-Facing structures (TELS) which will bring together the work being done in SLiDE and DEVeX with Davids LiMIT concept.

SLiDE (Solid/Liquid Lithium Divertor Experiment) is a current project that uses an electron beam to test liquid metal plasma facing components (PFCs) under a constant heat flux similar to those found in Fusion devices. This is the primary facility used to test the Lithium/Metal Infused Trenches (LiMIT) concept currently.

The Divertor Erosion and Vapor shielding eXperiment (DEVeX) facility is able to simulate the types of plasma’s as seen in a fusion reactor when there is an instability such as an Edge Localized mode. It also looks at lithium’s ability to shield a surface from the power flux that is incident on the surface.

TELS will bring both of these machines together to be able to test PFC components under not only steady state power fluxes as seen in fusion devices but at the same time test how they behave when there is a major pulsed disruption incident on the surface or an instability such as an Edge Localized mode (ELM). This is a vital study for fusion to make it viable since its is critical that PFC componetes can survive the harsh enviroments that are present inside a fusion reactor. TELS will go a long way in answering many of the question that scientists have about lithium’s viability as a liquid metal PFC and testing different design for liquid PFCs as well as have the ability to test other materials of interest for the first wall and divertor in a fusion reactor. The grant funding is for three years.

I am sure that you all will warmly congratulate David and his team of Post-docs students and research engineer that have worked hard to get this proposal funded.

Congratulations, CPMI Graduates!

June 1, 2012

This past May many CPMI students (and even a staff member!) received degrees from the University of Illinois. We would like to congratulate all undergrads, graduates and staff members that graduated this year. You worked hard and you deserve it!

Congratulations to Peter Filis on Undergraduate Awards

April 20, 2012

As a former undergraduate assitant and new graduate research assistant, CPMI would like to congratulate Peter Fiflis for receiving the NPRE Outstanding Undergraduate Research Award and the NPRE Outstanding Academic Achievement Award to a Graduating Senior. Great job Peter!

Former Grad Student Phi Nguyen – New Intel VP

April 4, 2012

Phi Nyugen, a former CPMI gradaute student has recently been named the new Vice President of the Tecnology and Manufacturing Group at Intel.

Nguyen is responsible for the process development, equipment development, fabrication operations and transfer of next-generation novel materials and process technologies that will produce future Intel microprocessors. Nguyen also manages the development, training, integration and coaching of engineering staff at Portland Technology Development.

Nguyen joined Intel in 1990 as a process engineer in the Portland Technology Development group. Since then, he has held various technical and management positions within the group and contributed to the development, transfer and ramp-up of the most recent logic technologies. He has since managed the development, transfer and ramp-up of novel materials and far back-end modules for Intel’s 22-nanometer logic technology.