Congratulations Dhruval for being selected as one of the four finalists of this year’s Coburn and Winters (C&W) Student Award in Plasma Science and Technology Division (PSTD) of American Vacuum Society (AVS)!
This is a very important recognition. We are all proud of you !
As a finalist, Dhruval will receive a cash award of $500, and an opportunity to present his work to the Executive Committee of AVS PSTD commitee for winning the C&W award with additional cash prize and certificate.
At 12:20 pm, Wednesday Nov. 9, 2022, Dhruval is invited to a closed session located in Room 315 (CC) to showcase his work to the jury members of C&W Award. Each candidate will have 10 minutes for the presentation, and another 6 minutes for answering questions. Being a finalist itself is already an achievement and CPMI wishes you the best to win this competition.
SHADE has two 4-inch PVD sputtering guns, a load-lock and a rotating sample stage. It is also outfitted with detailed diagnostics to enable time-resolved measurements of HIPIMS discharges. It is powered by a Starfire Industries IMPULSE that is capable of cathode-voltage reversal. It has been used to make multi-layer mirrors, and do reactive sputtering experiments.
This is a PVD sputtering tool manufactured by the Material Research Corporation (MRC). It uses a 14 inch diameter target and a rotating magnet pack. We have outfitted it with a variety of HIPIMS power supplies, used a variety of magnet packs, diagnostics and internal ionization coils.
ECAP is a microwave-powered atmospheric-pressure plasma torch. It has three zones where reactants can be introduced to the plasma. In this way it can make a variety of coatings, which would normally require a vacuum system to produce.
When a femtosecond laser pulse hits a surface, the power is incredible. It is so intense that it instantly turns the surface into a plasma even before the laser pulse ends. This means there is a chance that the laser light is converted to surface plasmons, and they will deposit their energy as a constructively interfered wave. This leads to ripples on the surface with dimensions near the wavelength of the initial laser. This texturing can be used for photonic properties, or to alter the wetting of the surface. We learned that such ripples can prevent wetting of metal surfaces by lithium.
XCEED is an XTS-13-35 EUV source made by Xtreme Technologies. The same model source was used to make the very first chips that used EUV lithography in INTEL’s MET tool. It uses a discharge-produced plasma from a Z-pinch and puts 5 J of energy into the plasma in 5ns. This device will be re-purposed to study warm-dense matter in a project funded by Los Alamos National Laboratory.
