J. of Nuclear Materials, 378, 105-109 (2008).
Jawarski, M. A., Laua, C. Y., Urbansky, D. L., Malfa, M. B., Gray, T. K., Neumann, M. J., Ruzic, D. N.
Recent experiments with liquid lithium in magnetically confined plasmas have demonstrated improved plasma performance. These results have led researchers working on the National Spherical Torus Experiment to consider using [...]

Appl. Opt. 47, 2443-2451 (2008).
Qiu, H., Srivastava, S. N., Thompson, K. C., Neumann, M. J., Ruzic, D. N.
Successful implementation of extreme ultraviolet (EUV) lithography depends on research and progress toward minimizing collector optics degradation from intense plasma erosion and debris deposition. Thus studying the surface degradation process and implementing innovative methods, which could enhance the [...]

J. Vac. Sci. Technol., 26(3), 389-398 (2008).
Shin, H., Srivastava, S. N., Ruzic, D. N.
Tin (Sn) has the advantage of delivering higher conversion efficiency compared to other fuel materials (e.g., Xe or Li) in an extreme ultraviolet (EUV) source, a necessary component for the leading next generation lithography. However, the use of a condensable fuel in [...]

J. Applied Physics, 103, 044901-4 (2008).
Castano, D., Aghazarian, M., Ruzic, D. N.
Preliminary evidence of enhanced etching of rhenium by XeF2 under the influence of an electric field (3.36  GV/m) is presented. Scanning electron microscope photographs of sharp rhenium tips show etching of at least 0.40  µm ±0.07 in 32  min at the point of maximum electric field, indicating [...]

Physical Review B, 76, 205434 (2007).
Allain, J. P., Coventry, M. D., Ruzic, D. N.
The lithium sputtering yield from lithium and tin-lithium surfaces in the liquid state under bombardment by low-energy, singly charged particles as a function of target temperature is measured by using the Ion-surface Interaction Experiment facility. Total erosion exceeds that expected from conventional [...]

J. of Applied Physics, 102, 023301 (2007).
Srivastava, S. N., Thompson, K. C., Antonsen, E. L., Qiu, H., Spencer, J. B., Papke, D., Ruzic, D. N.
Next generation lithography to fabricate smaller and faster chips will use extreme ultraviolet (EUV) light sources with emission at 13.5  nm. A challenging problem in the development of this technology is the [...]

Journal of Micro/nanolithography Mems and Moems, 6:2, 23005 (2007).
Neumann, M. J., Defrees, R. A., Qiu, H., Ruzic, D. N., Khodykin, O., Ershov, A., Bristol, R. L.
One of the critical issues within extreme ultraviolet lithography is mirror lifetime and the degradation due to debris from the pinch. This research investigated and showed the efficacy of using [...]

J. Nuclear Materials, 363-365, 1032-1036 (2007).
Gray, T. K., Jaworski, M. A., Ruzic, D. N.
The ELM simulating plasma gun (ESP-gun) has been developed to study the effects of transient, blob-like plasmas on the plasma facing components of TOKAMAKs. ESP-gun utilizes a RF helicon plasma to pre-ionize a plasma column underneath a conical, θ-pinch coil, which is [...]

IEEE Transactions on Plasma Science, 35 (3), 606-613 (2007).
Ruzic, D. N., Thompson, K., Jurczyk, B., Antonsen, E. L., Srivastava, S. N., Spencer, J.
This paper studies the expanding plasma dynamics of ions produced from a 5J Z-pinch xenon light source used for extreme ultraviolet (EUV) lithography. Fast ion debris produced in such plasmas cause damage to [...]

J. Microlithography, Microfabrication, and Microsystems, 6(1), 013006 (2007).
Alman, D. A., Qiu, H., Spila, T., Thompson, K. C., Antonsen, E. L., Jurczyk, B. E., Ruzic, D. N.
Extreme ultraviolet (EUV) light sources with efficient emission at 13.5  nm are needed for next-generation lithography. A critical consideration in the development of such a source is the lifetime of collector [...]