CPMI Members Attend SPIE Advanced Lithography Conference

Published in 2017

CPMI Director Professor Ruzic and graduate students Dren Qerimi and Gianluca Panici were in San Jose this past week at the SPIE Advanced Lithography Conference. While at this conference, Gianluca was featured in an oral presentation on his poster on Study of ion-enhanced Sn removal by surface wave plasma for collector cleaning!