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The latest video in the CPMI catalog has been added! A brief video showing the inner workings of the Charging in Aspect Ratio Dependent Etching (CARDE) experiment is now loaded and ready for viewing. We expect the Oscar to arrive soon.

The researchers of the High Power Pulsed Magnetron Sputtering (HPPMS/HIPIMS) project have just uploaded their latest video overview of the research project in action.

High power pulsed magnetron sputtering (HPPMS)

High power pulsed magnetron sputtering (HPPMS/HIPIMS) has attracted considerable attention from industry due its ability to produce thin films and features of excellent adhesion, superior density, decreased roughness, and extreme conformity. The intense pulsed plasma density provides a large concentration of metal ions that produce high-quality, homogeneous coatings. The high ionization fraction allows for fine […]

The researchers of the Plasma Assisted Cleaning by Electrostatics (PACE) project have just uploaded their latest video overview of the research project in action.

Qiu, H., Srivastav, S. N., Thompson, K. C., Neumann, M. J., Ruzic, D. N., “Effectiveness of Mo-Au Gibbsian segregating alloys and the surface removal effect on the Gibbsian segregating performance for extreme ultraviolet collector optics,” Optical Engineering 48 (5), 056501, May 2009.

Researchers within the CPMI were awarded their most recent pattern, “Submicron Particle Removal“, US 7,528,386 B2 on May 5, 2009.  Congratuations to David Ruzic, Brian Jurczyk, Darren Alman, Martin Neumann, and Huatan Qiu.