Plasma Sources Sci. Technol., 2, 100-105 (1993). Schatz, K. D., Ruzic, D. N. The operation of an electron-beam plasma source and its application as a secondary source of ionization in a radio frequency- (RF) powered reactive-ion-etching (RIE) reactor is investigated. RF-powered RIE is an important tool in the manufacture of semiconductor devices. One aspect of [...]Authors: Schatz, K. D., Ruzic, D. N.