With feature sizes shrinking to the nanometer scale, deformities in the trenches become more noticable. The walls of the trenches take on an undulating quality. This quality is known as Line Edge Roughness (LER) or Line Width Roughness (LWR). A novel idea to reduce this LER is being tested using samples supplied by Intel. After [...]
Featured News
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Congratulations to Peter Filis on Undergraduate AwardsApril 20, 2012
As a former undergraduate assitant and new graduate research assistant, CPMI would like to congratulate Peter Fiflis for receiving the NPRE Outstanding Undergraduate Research Award and the NPRE Outstanding Academic Achievement Award to a Graduating Senior. Great job Peter!
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Former Grad Student Phi Nguyen – New Intel VPApril 4, 2012
Phi Nyugen, a former CPMI gradaute student has recently been named the new Vice President of the Tecnology and Manufacturing Group at Intel. Nguyen is responsible for the process development, equipment development, fabrication operations and transfer of next-generation novel materials and process technologies that will produce future Intel microprocessors. Nguyen also manages the development, training, integration and coaching of [...]
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Congratulations Liang Meng!February 10, 2012
Congratulations to CPMI graduate student Liang Meng on passing his prelim today. We are all very proud!
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